发明名称 PRODUCTION METHOD FOR PATTERN-WORKED POROUS MOLDING OR NONWOVEN FABRIC, AND ELECTRIC CIRCUIT COMPONENTS
摘要 <p>A production method for a porous molding in which complicated and fine penetrated portions and recesses are pattern-worked. A pattern-worked porous molding or non-woven fabric in which a plated layer is selectively formed on the surfaces of penetrated portions and recesses. A mask having pattern-form penetrated portions is disposed on at least one surface of a porous molding or non-woven fabric, and fluid or fluid containing abrasive grains is sprayed over the mask to form penetrated portions or recesses or the both of them, to which the opening shape of the mask's penetrated portion is transferred, on the porous molding or non-woven fabric. A porous molding or non-woven fabric and an electric circuit components or the like in which a plated layer is selectively formed on the surfaces of penetrated portions or recesses or the both of them.</p>
申请公布号 KR20060126693(A) 申请公布日期 2006.12.08
申请号 KR20067013574 申请日期 2006.07.06
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 HAYASHI FUMIHIRO;MASUDA YASUHITO;OKUDA YASUHIRO
分类号 B24C1/04;C23C18/22;B24C3/32;B24C11/00;C23C18/16;H05K1/00;H05K3/10;H05K3/18 主分类号 B24C1/04
代理机构 代理人
主权项
地址