发明名称 |
FILM DEPOSITION METHOD, PIEZOELECTRIC FILM FORMED BY THE FILM DEPOSITION METHOD, PIEZOELECTRIC ELEMENT WITH THE PIEZOELECTRIC FILM, AND INK JET APPARATUS USING THE PIEZOELECTRIC ELEMENT |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To easily deposit a film of a desired pattern without using a mask or the like in a film deposition method using an aerosol deposition method. <P>SOLUTION: Particles are jetted toward a base body surface to deposit a film made of a material constituting the particle. This film deposition method comprises: a process of preparing a substrate having a surface equipped with at least two regions different in material depositing rate; and a process of selectively depositing the film containing a film-forming material on the region of larger coarseness of the two regions by jetting many particles containing the film depositing material onto the surface. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
申请公布号 |
JP2006326523(A) |
申请公布日期 |
2006.12.07 |
申请号 |
JP20050155530 |
申请日期 |
2005.05.27 |
申请人 |
CANON INC |
发明人 |
ISHIKURA ATSUMICHI;SHIBATA HISAARI;SAITO YASUYUKI |
分类号 |
B05D1/02;B41J2/045;B41J2/055;B41J2/135;B41J2/14;B41J2/16;C23C24/04;C23C28/00;H01L41/09;H01L41/187;H01L41/314;H01L41/39 |
主分类号 |
B05D1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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