发明名称 |
MASK CLEANING APPARATUS, MASK CLEANING METHOD, METHOD OF FORMING VAPOR-DEPOSITED FILM, DEVICE FOR MANUFACTURING EL DISPLAY DEVICE, AND METHOD OF MANUFACTURING EL DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method and cleaning apparatus which allows reduction of damage to a mask surface. SOLUTION: The cleaning apparatus for cleaning a mask for use in vapor-deposition includes a vacuum chamber which has the mask disposed therein, a support means for supporting the mask so that a top face and a bottom face of the mask are exposed, a plasma source which is arranged in an area other than the disposition area of the mask and generates etching gas for cleaning the mask, and a guide means for guiding the etching gas generated by the plasma source to the exposed top face and bottom face of the mask. COPYRIGHT: (C)2007,JPO&INPIT
|
申请公布号 |
JP2006330684(A) |
申请公布日期 |
2006.12.07 |
申请号 |
JP20060045233 |
申请日期 |
2006.02.22 |
申请人 |
KYOCERA CORP |
发明人 |
KANEKO KATSUHIRO;TAKEDA YOSHIRO;KOBAYASHI KAZUMASA;CHIN EIHO;MURAYAMA KOJI |
分类号 |
G09F9/00;B08B7/00;C23C14/04;G09F9/30;H01L27/32;H01L51/50;H05B33/10 |
主分类号 |
G09F9/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|