摘要 |
The aim of the invention is to increase the laser damage threshold LDT of diffraction grids, especially dielectrically coated (multi-layer dielectric; MLD) diffraction grids. To this end, the invention relates to a method for treating a diffraction grid to be used in a high-energy laser device comprising a first laser, said method comprising the following steps: the diffraction grid is prepared, a second treatment laser is prepared, and the diffraction grid is irradiated with laser light from the second treatment laser until the laser damage threshold of the diffraction grid is increased. The invention also relates to a diffraction grid treated according to said method, and a laser system comprising one such diffraction grid. |
申请人 |
GESELLSCHAFT FUER SCHWERIONENFORSCHUNG MBH;BORNEIS, STEFAN;ONKELS, ECKENHARD;JAVORKOVA, DASA;NEUMAYER, PAUL |
发明人 |
BORNEIS, STEFAN;ONKELS, ECKENHARD;JAVORKOVA, DASA;NEUMAYER, PAUL |