| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reference index plate with which cost increase and lowering of a yield are suppressed, and which is used for a large sized exposing device. <P>SOLUTION: The reference index plate 29 is used for the exposing device which exposes a mask pattern on a photosensitive substrate via a projection optical system and is made to be a reference of the pattern to be projected or an image projected via the projection optical system, and is equipped with a base plate 32, and a plurality of reference plates 32a-32e which are attached on the base plate 32 and which have reference marks 34a-34l formed thereon. <P>COPYRIGHT: (C)2007,JPO&INPIT |
