发明名称 PLATING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a plating method where more uniform plating can be applied to the object to be plated, and defects in plating can be remarkably reduced. <P>SOLUTION: At first, the object to be plated is wetted with a plating liquid, then, electric current is made zero for a prescribed time. Next, the electric current is applied to the object in the plating liquid and an electrode plate, so as to perform plating treatment. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2006328476(A) 申请公布日期 2006.12.07
申请号 JP20050153623 申请日期 2005.05.26
申请人 TDK CORP 发明人 GOTO MASASHI;AIBA TAKASHI;KUWAJIMA HAJIME;GUNJI TOMONORI
分类号 C25D7/00;C25D5/08;C25D21/12;H01L21/288;H05K3/46 主分类号 C25D7/00
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