METHOD FOR FINE LINE RESIST STRIPPING

摘要

The invention relates to a 2-step stripping process comprising the following stripping steps: a) treating the substrate with an aqueous solution containing a base, b) thereafter further treating the substrate with a solution containing a base and at least one stripping enhancer selected from the group consisting of hexylene glycol, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol monoisopropyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, diethylene glycol monobutyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monobutyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, triethylene glycol monopropyl ether, triethylene glycol monobutyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether, tripropylene glycol monopropyl ether, tripropylene glycol monobutyl ether, diethylenglycolmonoisopropyl ether and propylene glycol monomethyl ether acetate.