发明名称 |
TRANSPARENT CONDUCTIVE FILM, METHOD OF MANUFACTURING THE SAME, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a transparent conductive film on which fine patterning can be applied, prevented from change of characteristics and lowering of transmittance caused by gas or moisture, and to provide a manufacturing method of the same, an electro-optical device provided with the transparent conductive film, and elecronic equipment. SOLUTION: The method of manufacturing the transparent conductive film comprises a process of forming a bank B4 corresponding to a formation area of a pixel electrode (a transparent conductive film) 19 on a substrate P by using a material of which skeleton is composed of polysiloxane; a process of applying first function liquid containing transparent conductive fine particles to an area demarcated by the bank 4 by a liquid-drop discharge method; a process of forming a first layer film 19c by drying the first function liquid; a process of applying second function liquid containing a metal compound on the first layer film 19c by the liquid-drop discharge method; and a process of forming the transparent conductive layer 19a composed of the first layer film 19c and metal oxide filling in pores in the film by collectively baking the first layer film 19c and the second function liquid. COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2006331665(A) |
申请公布日期 |
2006.12.07 |
申请号 |
JP20050149100 |
申请日期 |
2005.05.23 |
申请人 |
SEIKO EPSON CORP |
发明人 |
HIRAI TOSHIMITSU;MORIYA KATSUYUKI |
分类号 |
H01B13/00;G02F1/1343;G02F1/1368;H01B5/14;H01L21/288 |
主分类号 |
H01B13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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