| 摘要 |
PROBLEM TO BE SOLVED: To evenly perform with good reproduction in a short time all processes from etching where an article to be processed is placed on the same sample holder and a fine structure is formed on the surface with an etchant to drying by supercritical fluid. SOLUTION: The method of processing the microstructure is configured such that, after etching of forming a microstructure by performing etching to the article placed on a sample holder by an etchant, the etchant is substituted for pure water, and then, after the pure water is substituted for an organic solvent, the article is taken out from a substitution processor and the organic solvent is removed from the article by the supercritical fluid and is subjected to supercritical drying. In the method, the article undergoes all processings from the etching to the supercritical drying while being placed on the sample holder. COPYRIGHT: (C)2007,JPO&INPIT
|
