发明名称 Semiconductor device and its manufacture method, and measurement fixture for the semiconductor device
摘要 A semiconductor device comprises a substrate, a ferroelectric capacitor which includes a ferroelectric film on the substrate, and a stress application layer which applies tensile or compressive stress to the ferroelectric film of the ferroelectric capacitor by applying stress to the substrate.
申请公布号 US2006273365(A1) 申请公布日期 2006.12.07
申请号 US20060440068 申请日期 2006.05.25
申请人 发明人 CROSS JEFFREY S.;TSUKADA MINEHARU;HORII YOSHIMASA;GRUVERMAN ALEXEI;KINGON ANGUS
分类号 H01L29/94 主分类号 H01L29/94
代理机构 代理人
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