发明名称 |
Oxidation method and oxidation system |
摘要 |
An oxidation method is capable of forming oxide films in an improved interfilm thickness uniformity. The oxidation method includes the steps of supplying an oxidizing gas and a reducing gas into a processing vessel 22 capable of being evacuated and holding a plurality of workpieces W arranged at predetermined pitches, and creating a process atmosphere containing active oxygen species and active hydroxyl species in the processing vessel 22 through the interaction of the oxidizing gas-and the reducing gas. At least either of the oxidizing gas and the reducing gas is jetted into an upstream region S 1 , a middle region S 2 and a downstream region S 3 , with respect to the flowing direction of the gas, of a processing space S containing the workpieces W.
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申请公布号 |
US2006276051(A1) |
申请公布日期 |
2006.12.07 |
申请号 |
US20060502503 |
申请日期 |
2006.08.11 |
申请人 |
HASEBE KAZUHIDE;UMEZAWA KOTA;TAKAHASHI YUTAKA |
发明人 |
HASEBE KAZUHIDE;UMEZAWA KOTA;TAKAHASHI YUTAKA |
分类号 |
H01L21/31;H01L21/00;H01L21/316;H01L21/469 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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