SEMICONDUCTOR CLEANING LIQUID COMPOSITION CONTAINING PHOSPHONIC ACID AND ASCORBIC ACID, AND METHOD OF CLEANING

摘要

[PROBLEMS] To provide a semiconductor cleaning liquid composition containing phosphonic acid and ascorbic acid, and provide a relevant method of cleaning. [MEANS FOR SOLVING PROBLEMS] A composition that in the operation of semiconductor wafer processing, is used for cleaning performed to remove residues; and a relevant method of cleaning. The composition comprises at least one fluorocompound (a) selected from among hydrofluoric acid, acid ammonium fluoride and ammonium fluoride, at least one organic solvent (b), phosphonic acid (c), ascorbic acid (d), at least one basic compound (e) and water (f). Further, as an optional component of the composition, there may be added at least one mercapto-having anticorrosive agent (g).