RESIST MATERIAL, AND RESIST MATERIAL FOR ELECTRON BEAM RECORDING

摘要

This invention generally provides a resist material that has high sensitivity to light and electron beams and can form a clear and fine pattern at a smaller exposure. The resist material comprises a metal compound and is characterized in that a metal element constituting the metal compound is a group 14 or 15 metal element and the metal compound is a stoichiometrically incomplete compound.