| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a highly accurate drift correction method with which a photomask is scarcely damaged, by solving problems associated with the conventional photomask correction method using a one-point-drift correction such as occurrence of a scan damage on a place other than a place with a defect on the photomask, inability to open any pin hole in the case of a fine pattern, and so on. <P>SOLUTION: Without forming any mark for measuring a drift, such as the pin hole, the correction to keep a beam irradiation position constant is conducted by calculating a produced drift amount by: utilizing the defect 3 and information of a pattern CAD as marks; and using the defect 3 to be corrected or a pattern on the periphery of the defect as reference positions in correcting the defect 3 with a suitable frequency. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
