发明名称 High density hybrid MOSFET device
摘要 A hybrid semiconductor power device that includes a plurality of closed power transistor cells each surrounded by a first and second trenched gates constituting substantially a closed cell and a plurality of stripe cells comprising two substantially parallel trenched gates constituting substantially an elongated stripe cell wherein the closed cells and stripe cells constituting neighboring cells sharing trenched gates disposed thereinbetween as common boundary trenched gates. The closed MOSFET cell further includes a source contact disposed substantially at a center portion of the closed cell wherein the trenched gates are maintained a critical distance (CD) away from the source contact.
申请公布号 US2006273383(A1) 申请公布日期 2006.12.07
申请号 US20050223621 申请日期 2005.09.11
申请人 M-MOS SDN. BHD. 发明人 HSHIEH FWU-IUAN
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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