发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, LAYERED PRODUCT, AND PROCESS FOR PRODUCING THE SAME
摘要 <p>A radiation-sensitive resin composition which comprises a cycloolefin polymer, a radiation-sensitive compound, and 10-60 parts by weight of an alkoxysilane compound per 100 parts by weight of the cycloolefin polymer; a layered product which comprises a base and, superposed thereon, a resinous film formed from the composition; and a process for producing a layered product which comprises the step of forming a resinous film on a base from the composition. The radiation-sensitive resin composition gives a resinous film having excellent high-temperature shape retention. It has a wide temperature margin for melt flowing in forming a patterned resinous film and is suitable for use also as a resist material.</p>
申请公布号 WO2006129875(A1) 申请公布日期 2006.12.07
申请号 WO2006JP311379 申请日期 2006.05.31
申请人 ZEON CORPORATION;SHINDOU, HIROAKI 发明人 SHINDOU, HIROAKI
分类号 G03F7/075;G03F7/004;G03F7/023;G03F7/40;H01L21/027 主分类号 G03F7/075
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