发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION, LAYERED PRODUCT, AND PROCESS FOR PRODUCING THE SAME |
摘要 |
<p>A radiation-sensitive resin composition which comprises a cycloolefin polymer, a radiation-sensitive compound, and 10-60 parts by weight of an alkoxysilane compound per 100 parts by weight of the cycloolefin polymer; a layered product which comprises a base and, superposed thereon, a resinous film formed from the composition; and a process for producing a layered product which comprises the step of forming a resinous film on a base from the composition. The radiation-sensitive resin composition gives a resinous film having excellent high-temperature shape retention. It has a wide temperature margin for melt flowing in forming a patterned resinous film and is suitable for use also as a resist material.</p> |
申请公布号 |
WO2006129875(A1) |
申请公布日期 |
2006.12.07 |
申请号 |
WO2006JP311379 |
申请日期 |
2006.05.31 |
申请人 |
ZEON CORPORATION;SHINDOU, HIROAKI |
发明人 |
SHINDOU, HIROAKI |
分类号 |
G03F7/075;G03F7/004;G03F7/023;G03F7/40;H01L21/027 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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