发明名称 EQUIPMENT AND METHOD FOR PROCESSING SEMICONDUCTOR
摘要 Semiconductor processing equipment includes a transfer chamber (3) having a plurality of transfer ports (33) arranged at different positions in a lateral direction. A process chamber (4A) for performing a semiconductor process to a substrate (W) to be processed is connected with the transfer chamber (3) through one of the transfer ports. A transfer arm device (5) is arranged in the transfer chamber (3) so as to transfer the substrate (W) through a plurality of the transfer ports (33). A drive mechanism (55) is arranged so as to extend and retract the transfer arm device (5) and to turn it in a vertical axis direction. Inclination adjusting mechanisms (6A-6C) are arranged so as to adjust the inclination of the transfer arm device (5).
申请公布号 KR20060126600(A) 申请公布日期 2006.12.07
申请号 KR20067018773 申请日期 2006.09.13
申请人 TOKYO ELECTRON LIMITED 发明人 HIROKI TSUTOMU
分类号 B25J9/06;H01L21/68;B25J9/00;B25J9/04;B25J13/08;B65G49/07;H01L21/00;H01L21/677 主分类号 B25J9/06
代理机构 代理人
主权项
地址