SYSTEM FOR MANUFACTURING MASK, METHOD FOR PREPARING MASK DATA, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a system for manufacturing a mask by which the development period of a photomask can be shortened by reusing an accumulated data processing environment.

SOLUTION: The system for manufacturing the mask is provided with: a plurality of operational processing modules 404a-404n respectively conducting logical processing and arithmetic processing; a module selecting portion 350 to select one out of the plurality of operational processing modules 404a-404n as a module to be selected; an optical proximity effect correction portion 322 to apply an optical proximity effect correction to a data to be processed by using the module to be selected and using correction information adopted for an optical proximity effect correction of an accumulated data which is equivalent to a data to be processed in a semiconductor integrated circuit in terms of a coverage out of data accumulated in a plurality of semiconductor integrated circuits; a converting portion 326 to convert the data to be processed subjected to the optical proximity effect correction into a mask data by using the module to be selected; and a drawing device 4 to read the mask data and to draw the mask pattern corresponding to the semiconductor integrated circuit on a mask substrate.

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