发明名称 IMPRINTING DEVICE AND FINE STRUCTURE TRANSFERRING METHOD
摘要 PROBLEM TO BE SOLVED: To uniformly pressurize a stamper to the surface of a transfer target substrate, to control the in-plane pressure distribution matched to the surface state or appearance shape of the stamper or the transfer target substrate and to peel the stamper from the transfer target substrate immediately after pressurization in an imprinting device and a fine structure transferring method. SOLUTION: In the imprinting device and the fine structure transferring method, a fluid is ejected from the back of at least one of the stamper and the transfer target substrate during pressurization. The fluid is ejected from a plurality of the holes provided to the stage arranged to the back of the stamper or the transfer target substrate and a plurality of the holes are connected to an independent pressure adjusting mechanism. Further, when the stamper is peeled from the transfer target substrate, the stamper or the transfer target substrate is sucked and fixed to the stage by a plurality of the holes to be peeled. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006326927(A) 申请公布日期 2006.12.07
申请号 JP20050151322 申请日期 2005.05.24
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 ANDO TAKUJI;KOMORIYA SUSUMU;OGINO MASAHIKO;HAGINOYA CHISEKI;MIYAUCHI AKIHIRO
分类号 B29C59/02;G11B5/855 主分类号 B29C59/02
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