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发明名称
VERFAHREN ZUR HERSTELLUNG VON EINEM SILIZIUM WAFER MIT IDEALEM SAUERSTOFFNIEDERSCHLAGVERHALTEN
摘要
申请公布号
DE69933777(D1)
申请公布日期
2006.12.07
申请号
DE19996033777
申请日期
1999.08.27
申请人
MEMC ELECTRONIC MATERIALS INC.
发明人
FALSTER, J.
分类号
H01L21/322;H01L21/324
主分类号
H01L21/322
代理机构
代理人
主权项
地址
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