| 摘要 |
PROBLEM TO BE SOLVED: To prevent the generation of a water mark due to micro water drop by drying a substrate without heating the substrate itself. SOLUTION: The substrate processing apparatus is provided with an infrared LED 26 on the opposite face 11 of a shielding plate 10 that is provided above a substrate W held by a spin chuck 1. A rinsing liquid is supplied to the substrate W to rinse it, the rinsing liquid adhering to the substrate W is almost shaken off, and then an infrared light is directed to the substrate W from the infrared LED 26. Thus, the substrate W itself almost passes the infrared light therein, so that the substrate W is not heated, and a micro liquid drop adhering to the substrate W absorbs the infrared light so that the micro liquid drop is heated and evaporated. COPYRIGHT: (C)2007,JPO&INPIT
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