发明名称 VACUUM DEPOSITION DEVICE FOR LIQUID CRYSTAL ALIGNMENT LAYER AND DEPOSITION METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a vacuum deposition device for a liquid crystal alignment layer which efficiently forms an inorganic alignment layer with simple structure even when a deposition object is a large substrate. SOLUTION: In the vacuum deposition device for the liquid crystal alignment layer having a vacuum vessel 1 with an exhaust means and a deposition source 2 inside the vacuum vessel, it is constituted by providing slits which are slits 3 horizontally arranged centering around a vertical line of the deposition source and of which the plurality of openings for passing deposition materials are radially provided and a substrate holding means arranged at a position opposite to the deposition source via the slits and for holding substrate by arranging them on the circumference centering around the vertical line, capable of adjusting an incident angle formed by a straight line connecting an optional point on the substrate with the deposition source and a perpendicular line of the substrate into a predetermined angle, the substrate and the slits are relatively rotatable centering around the vertical line, deposition materials passed the slits are deposited on the substrate in the slanting direction and the alignment layer is formed. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006330656(A) 申请公布日期 2006.12.07
申请号 JP20050210987 申请日期 2005.07.21
申请人 SHOWA SHINKU:KK 发明人 ISHIGAMI TATSUSHI;USUI RYUICHIRO
分类号 G02F1/1337;C23C14/24;C23C14/54 主分类号 G02F1/1337
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