发明名称 METHOD OF TAKING SHAPE SIMULTANEOUSLY BOTH COLUMN SPACER AND OVERCOAT ON COLOR FILTER OF LCD AND NEGATIVE PHOTORESIST COMPOSITION USABLE THERETO
摘要 Provided are a method for simultaneously forming a protective film for color filter and a column spacer of liquid crystal display(LCD) device having good shape and profile on board of the color filter, and a negative photoresist composition capable of increasing a difference of heights of the protective film and the column spacer, and forming an even surface. The method comprises the steps of (S1) applying a negative photoresist composition on board of LCD device having black matrix(106) and color filter(107) to form a photoresist film(121); (S2) exposing the photoresist film(121) through a mask(200), wherein the mask(200) comprises a semi-penetration part(area B) which transmits a part of incident UV only, and has a location adjusted so as to correspond to the color filter(107), and a penetration part(area A) which transmits all incident UV and has a location adjusted so as to correspond to the black matrix(106); and (S3) developing the exposed photoresist film, so that the part of photoresist film, which is exposed through the semi-penetration part of the mask and retains a part of height, is formed into the protective film for color filter, and part of photoresist film, which is exposed through the penetration part of the mask and retains a total height, is formed into the column spacer.
申请公布号 KR20060125993(A) 申请公布日期 2006.12.07
申请号 KR20050047524 申请日期 2005.06.03
申请人 SEKISUI FINE CHEM KOREA CO., LTD. 发明人 CHOL, SOOK YOUNG;KIM, SEON HYUK;KIM, HYO JOON;PARK, JI HYUN;PARK, EUN SUK
分类号 G03F7/00;G03F7/039 主分类号 G03F7/00
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