| 摘要 |
<P>PROBLEM TO BE SOLVED: To optimally choose the intensity of the off-axis beam for each direction incident on a reticle. <P>SOLUTION: A method includes a step 500 of providing information on a target pattern of an image to be formed on a wafer, a step of choosing, according to the information on the target pattern, each variable that indicates the intensity of the off-axis beam for each direction, by dividing the directions of the off-axis beams that guide the sets of diffracted lights of the same diffraction orders from among the diffracted lights of various diffraction orders, generated from a reticle into the ranges of the directions of the off-axis beams within a pupil of a lens that projects the light from the reticle on the wafer; a step of providing a function indicating the image to be obtained on the wafer, that includes the variable indicating the intensity of the off-axis beam for each direction; a step 510 of providing merit function that shows the relation between the intensity of the off-axis beam for each direction and the image characteristics, expressed by the function, and a step 550 of deriving the solution for the intensity of the off-axis beam for each direction that optimizes the value of the merit function. <P>COPYRIGHT: (C)2007,JPO&INPIT |
