发明名称 MANUFACTURING METHOD FOR P-TYPE SURFACE CONDUCTIVE LAYER ON OXYGEN-TERMINATED (111) DIAMOND
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for a p-type surface conductive layer on a (111) homoepitaxial diamond thin film. SOLUTION: The surface of a flat homoepitaxial diamond film of low surface level density grown on a diamond (111) single-crystal substrate by a vapor-phase growing method using carbon hydride is terminated with oxygen atoms by boiling and washing processing using mixed acid, processing using oxygen plasma, or atmospheric annealing to obtain p-type surface conductive oxygen-terminated (111) diamond. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006332387(A) 申请公布日期 2006.12.07
申请号 JP20050154777 申请日期 2005.05.27
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 RI SEIKI;YAMAZAKI SATOSHI;OGUSHI HIDEYO;SHIKADA SHINICHI
分类号 H01L21/205 主分类号 H01L21/205
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