发明名称 |
MANUFACTURING METHOD FOR P-TYPE SURFACE CONDUCTIVE LAYER ON OXYGEN-TERMINATED (111) DIAMOND |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for a p-type surface conductive layer on a (111) homoepitaxial diamond thin film. SOLUTION: The surface of a flat homoepitaxial diamond film of low surface level density grown on a diamond (111) single-crystal substrate by a vapor-phase growing method using carbon hydride is terminated with oxygen atoms by boiling and washing processing using mixed acid, processing using oxygen plasma, or atmospheric annealing to obtain p-type surface conductive oxygen-terminated (111) diamond. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2006332387(A) |
申请公布日期 |
2006.12.07 |
申请号 |
JP20050154777 |
申请日期 |
2005.05.27 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
RI SEIKI;YAMAZAKI SATOSHI;OGUSHI HIDEYO;SHIKADA SHINICHI |
分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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地址 |
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