发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device wherein regions of a second polarity opposite to a first polarity is formed on the well region of the first polarity according to a simple manufacturing process, and to provide a manufacturing method thereof relating to the semiconductor device wherein well regions of the second polarity opposite to the first polarity is arranged around the well region of the first polarity and a manufacturing method thereof. SOLUTION: This invention comprises a region provided on the well region of the first polarity and formed by superposing the well regions (131, 141) of the second polarity on the well region (121) of the first polarity in the semiconductor device, wherein the well regions (131, 141) of the second polarity are arranged around the well region (121) of the first polarity. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006332371(A) 申请公布日期 2006.12.07
申请号 JP20050154434 申请日期 2005.05.26
申请人 MITSUMI ELECTRIC CO LTD 发明人 KIMURA HIROSHI;WATANABE SADAHISA
分类号 H01L21/8236;H01L21/822;H01L21/8234;H01L27/04;H01L27/06;H01L27/088 主分类号 H01L21/8236
代理机构 代理人
主权项
地址