| 摘要 |
PROBLEM TO BE SOLVED: To provide a transfer apparatus equipped with a gimbal mechanism constituted so as not only to suppress positional shift small but also to perform mold release without damaging a fine uneven shape when the fine uneven pattern formed on the surface of a mold is transferred to the surface of a product to be molded using a lithographic technique, and a transfer method using it. SOLUTION: The transfer apparatus equipped with the gimbal mechanism comprises a table loaded with the substrate of a molding material, a mold holding body for fixing and holding the mold arranged in opposed relation to the surface of the table, a first gimbal member which holds the mold holding body and has a protruded spherical surface part formed thereto, a second gimbal member having a recessed spherical surface part, which is opposed to the protruded spherical surface part of the first gimbal member, formed thereto, a movable body which holds the second gimbal member to advance and retreat in an up and down direction, a movable body driving means for moving the movable body up and down and a posture adjusting and holding means for adjusting and holding the posture of the first gimbal member. COPYRIGHT: (C)2007,JPO&INPIT
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