发明名称 NONVOLATILE MEMORY
摘要 <p>There is provided a nonvolatile memory realizing nonvolatile characteristic similar to a flash memory and a high-speed access equivalent to SRAM, enabling integration exceeding DRAM, and requiring low voltage obtained by small-size battery drive and low power consumption. There are provided: [1] a nonvolatile memory having a nano-hole-containing metal oxide film having a honeycomb structure and a film thickness of 0.05 to 5 µm arranged in a shot key joint between a pair of metal electrodes so as to utilize the boundary level formed on the partition wall of the nano-hole-containing metal oxide film as a memory charge holder; and [2] a nonvolatile memory including a substrate electrode, nano-hole-containing metal oxide film formed by anode-oxidizing the surface of the substrate electrode, and a metal electrode shot key-joined on the upper end portion of the partition wall of the nano-hole-containing metal oxide film, wherein the nano-hole-containing metal oxide film has a structure of a plurality of dual shot key partition walls formed in parallel.</p>
申请公布号 WO2006129367(A1) 申请公布日期 2006.12.07
申请号 WO2005JP10190 申请日期 2005.06.02
申请人 MISUZU R & D LTD.;NIGO, SEISUKE;OHNISHI, TAKAYUKI 发明人 NIGO, SEISUKE;OHNISHI, TAKAYUKI
分类号 H01L27/10;H01L29/06 主分类号 H01L27/10
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