发明名称 EXHAUST-LINE OF CHEMICAL VAPOR DEPOSITION
摘要 An exhaust line of a chemical vapor deposition apparatus is provided to prevent degradation of valves by rapidly exhausting a powder generated from the exhaust line. A vacuum pump(16) is installed on an exhaust line(14) connected to an exhaust outlet(12) of a process chamber(10). A first valve(18) and a second valve(20) are provided at the exhaust line. The exhaust line(14) connects the exhaust outlet of the process chamber to the vacuum pump to exhaust residual gas in the process chamber. An inclined section(22) is arranged between an end of the exhaust line and the first valve, and inclined with a predetermined angle centering the exhaust outlet. Therefore, a powder is rapidly exhausted.
申请公布号 KR20060126215(A) 申请公布日期 2006.12.07
申请号 KR20050047947 申请日期 2005.06.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KANG, MIN SU;KIM, CHANG MIN;LEE, SANG HYUN
分类号 H01L21/205;H01L21/02 主分类号 H01L21/205
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