APPARATUS FOR PROVIDING GAS FOR USING SEMICONDUCTOR FABRICATING APPARATUS

摘要

A gas supplying apparatus for used in a semiconductor manufacturing apparatus is provided to determine an error of a flow controller rapidly by including a flow sensor for detecting flow amount besides the flow controller. One or more gas line(24a-24n) supplies gases into a chamber(26). One or more flow controller(22a-22n) is connected to each gas line to control flow of the gas flowed into the chamber through the gas line. One or more flow sensor(28a-28n) is installed between the flow controller and the chamber and detects the flow of the gas inputted by passing through the flow controller to generate a second voltage level signal corresponding to the flow. A controller(20) generates a first voltage level signal corresponding to the gas amount to flow in the chamber through the gas line to transmit it to the flow controller. The controller calculates difference between the first voltage level signal and the second voltage level signal and determines whether the difference is over predetermined error limit or not to determine the matter of the flow controller. A display unit(30) receives a signal about the matter from the controller to display the result.