发明名称 PROCESS FOR PRODUCING ELECTRONIC SUBSTRATE, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND PROCESS FOR MANUFACTURING ELECTRONIC APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To achieve thinning and high density without causing cost increase and deterioration in productivity. <P>SOLUTION: Electronic components 40-42 are mounted on a substrate 5. A process for burying the electronic components 40-42 in the substrate 5, and a process for forming a wiring pattern 23 connected with external connection electrodes 40a-42a of the electronic components 40-42 buried in the substrate 5 by ejecting a liquid drop containing a conductive material are provided. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2006332094(A) 申请公布日期 2006.12.07
申请号 JP20050149097 申请日期 2005.05.23
申请人 SEIKO EPSON CORP 发明人 ITO HARUKI
分类号 H05K3/46;H01L23/12;H05K1/18 主分类号 H05K3/46
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