| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To polish a film to be polished with high planarity in a short period of time as for a method for polishing the objective film. <P>SOLUTION: A polishing process of polishing the objective film 3 deposited on a substrate 1 is divided into three steps. At a first polishing step, the film is polished using a first polishing agent 4 mainly consisting of pure water, first polishing abrasive grains 5 and a dispersant 6. At a second polishing step, the film is polished using a second polishing agent 7 mainly consisting of pure water, second polishing abrasive grains 8 the hardness of which is lower than that of the film 3 and the first polishing abrasive grains 5, and a surfactant 9. At a third polishing step, the film is polished using a third polishing agent 10 obtained by diluting the second polishing agent 7 with pure water. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
