发明名称 Semiconductor device and method for manufacturing semiconductor device
摘要 A semiconductor device with a capacitor comprises a lower electrode, a dielectric and an upper electrode on the dielectric layer. The dielectric layer comprising one or more polycrystalline tantalum oxide layers and one or more separation layers, wherein the polycrystalline tantalum oxide layers and the separation layers are alternately stacked, while one of the polycrystalline tantalum oxide layers is a lowermost layer among the stacked layers.
申请公布号 US2006273426(A1) 申请公布日期 2006.12.07
申请号 US20060434877 申请日期 2006.05.17
申请人 ELPIDA MEMORY, INC. 发明人 LIJIMA SHINPEI
分类号 H01L29/00 主分类号 H01L29/00
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