| 发明名称 |
METHOD FOR FORMING PHOTO-DEFINED MICRO ELECTRICAL CONTACTS |
| 摘要 |
A method of manufacturing a probe test head for testing of semiconductor integrated circuits includes: defining shapes of a plurality of probes (81) as one or more masks (73); a step for fabricating the plurality of probes using the mask (73); and disposing the plurality of probes (81) through corresponding holes in a first die (42) and a second die (44). The step for fabricating the plurality of probes (81) may include one of photo-etching and photo- defined electroforming. |
| 申请公布号 |
KR20060126480(A) |
申请公布日期 |
2006.12.07 |
| 申请号 |
KR20067010070 |
申请日期 |
2004.10.22 |
| 申请人 |
WENTWORTH LABORATORIES, INC. |
发明人 |
MCQUADE FRANCIS T.;BARTO CHARLES L.;TRUCKLE PHILLIP M. |
| 分类号 |
G01R31/26;H01L21/66;G01R1/067;G01R1/073;G01R3/00;G01R31/02;H01L;H01L21/00;H01L21/44;H01R9/00;H01R43/00 |
主分类号 |
G01R31/26 |
| 代理机构 |
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