| 摘要 |
<P>PROBLEM TO BE SOLVED: To measure a change amount of aberration of a projection optical system by irradiation of exposure light under a condition adjusted to an actually used condition as much as possible. <P>SOLUTION: The projection optical system PL is irradiated with illumination light IL through an actual exposure reticle R, and an irradiation amount of illumination light is gradually increased on the projection optical system PL. A reticle mark board RFM where an aberration measurement pattern is formed is moved to an illumination region of illumination light IL at a prescribed time interval in a process where the irradiation amount of illumination light is gradually increased. A space image measuring device 59 measures a space image of the aberration measurement pattern. Thus, wavefront aberration of the projection optical system PL is obtained. <P>COPYRIGHT: (C)2007,JPO&INPIT |
