| 摘要 |
A method of forming an insulating film includes: forming a polysiloxane insulating film on a substrate; forming a polycarbosilane insulating film on the polysiloxane insulating film; and forming a CVD insulating film on the polycarbosilane insulating film by plasma chemical vapor deposition (CVD). The polysiloxane insulating film is formed by hydrolysis and condensation of a silane compound, and the polycarbosilane insulating film is formed by applying a solution obtained by dissolving a polycarbosilane compound in a solvent, and heating the resulting coating.
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