| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic device having a high throughput and that can transfer patterns with relatively small structures on substrates. <P>SOLUTION: The invention relates to a dual stage lithographic device, in which two substrate stages are constructed to cooperate with each other to perform a joint sweep movement for guiding the lithographic device from a first condition, a condition in which an immersion liquid is confined between a first substrate carried by a first stage of the stages and a final element of the projection system in the device, to a second condition, a condition in which the liquid is confined between a second substrate carried by a second stage of the two stages and the final element, such that during the joint sweep movement, the liquid is confined to be substantially within the described space with respect to the final element. <P>COPYRIGHT: (C)2007,JPO&INPIT |
