MASKING APPARATUS, SURFACE PROCESSING METHOD USING THIS, AND SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a masking device performing highly precise surface treatment by preventing an unsatisfactory portion being produced in the boundary between the masking device and a first region and its vicinity when selectively applying the surface treatment to the first region of the base material surface by using the masking device, and also to provide a surface treatment method using the masking device, and the base material formed by this method.

SOLUTION: When masking a second region (U) different from the first region (M) to apply surface treatment to the first region (M) of the surface of the base material 100, a facing surface facing the surface of the base material 100 is formed at the end part corresponding to the vicinity of the boundary between the first region (M) and the second region (U). This masking device 1 is equipped with a gap forming part 13 forming a gap between the surface of the base material 100 and the facing surface 14.

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