| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a bow-tie antenna using relatively low-level photolithography. <P>SOLUTION: An etching mask 201 of a shape similar to the top surface 102e of a quadangular truncated pyramid 102 is formed on a substrate 101, and the substrate 101 is isotropically etched using the etching mask 201 as a mask material, whereby the quadangular truncated pyramid 102 is formed. Thereafter, evaporation sources are incident on the front faces of two opposed side surfaces 102a and 102b of the pyramid 102 in parallel to the substrate 101, respectively, whereby metal films 103 and 104 are formed. <P>COPYRIGHT: (C)2007,JPO&INPIT |
