| 摘要 |
<p>An interlock system of photo equipment and a driving method thereof are provided to maximize productivity of the photo equipment by continuously driving the expensive photo equipment. A measuring unit(20) measures a critical dimension or degree of an overlay of a pattern on a wafer with respect to a lot whose photo process for a predetermined patterning is completed. A controller(40) compares the measured value by the measuring unit with a predetermined reference range and determines it. An interlock unit(60) interlocks progress of the lot, the photo process, or photo equipment according to the result compared and determined by the controller. The interlock unit includes a lot progress on/off unit(62), a photo process on/off unit(64), and a photo equipment on/off unit(66). The lot progress on/off unit interlocks progress to a next process of the photo process to the lot. The photo process on/off unit interlocks the photo process. The photo equipment on/off unit interlocks an operation of the photo equipment.</p> |
