APPARATUS FOR PROCESSING A SUBSTRATE

摘要

An apparatus for processing a substrate is provided to suppress an electrical shock due to an electrical conducting state between a shower head and a gas supply line by forming a coupling member with a ceramic material. A chamber(102) is used for accommodating a substrate and processing the substrate. A shower head(110) includes a gas inflow tube(112) and a first flange(114) coupled with an end of the gas inflow tube. The shower head is installed at a top part of the chamber in order to introduce process gas onto the substrate. A gas supply unit(120) includes a gas supply tube(122) connected with the gas inflow tube and a second flange(128) coupled with an end of the gas supply tube in order to supply the process gas through the gas supply tube to the shower head. A plurality of coupling members(130) penetrate the first and second flanges in order to connect the gas supply unit and the shower head to each other.