发明名称 APPARATUS TO SETTLE FPD SUBSTRATE SUITABLE FOR THE STAGE OF LASER ANNEALING CHAMBER
摘要 An apparatus for fixing an FPD substrate suitable for a stage of a laser thermal process is provided to be easily exchanged and reduce an exchange cost by decreasing a size of an electrostatic chuck. An apparatus for fixing an FPD substrate suitable for a stage of a laser thermal process includes a stage upper plate(20), an electrostatic chuck(40), and a power supplier. A plurality of robot arm valleys(24a,24b) are formed on a planar upper plane of the stage upper plate(20) in parallel. A plurality of electrostatic chuck grooves are arranged on a crest of the robot arm valleys along a length of the crest at a regular interval. The electrostatic chuck(40) is inserted into the electrostatic chuck groove formed on the crest of the stage upper plate(20). The power supplier provides the electrostatic chuck(40) with power through the stage upper plate(20).
申请公布号 KR100656685(B1) 申请公布日期 2006.12.06
申请号 KR20050109263 申请日期 2005.11.15
申请人 KORNIC SYSTEMS CORP. 发明人 CHO, WOON KI;NAM, WON SIK;YEON, JUNG RYUN;KIM, DOH HOON;YANG, SANG HEE
分类号 H05B33/10 主分类号 H05B33/10
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