IMMERSION LITHOGRAPHY DEVICE

摘要

An immersion lithography device is provided to prevent contamination of a wafer stage and contamination of upper/lower ends of a wafer by dipping a wafer stage into an immersion solution. A guide unit(16) guides exposure beams received from an exposure source. A lens(11) is installed at a lateral end of the guide unit. A reflecting member(15) is installed in the inside of the guide unit in order to reflect vertically the exposure beams to the lens. A wafer stage(14) is installed vertically to the ground so that an upper surface of the wafer stage faces the lens. A liquid supply unit(12) supplies an immersion solution between the wafer and the lens. The wafer stage includes vacuum holes in order to absorb and fix the wafer in a vacuum state.