| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a plasma type PFC (perfluorocompound) decomposition system having a means for maintaining high PFC decomposition performance by efficiently removing metal impurities contained in PFC-containing gas and preventing the clogging caused by the deposition of the metal impurities, the corrosion of exhaust gas suction devices caused by corrosive gas, and the like. <P>SOLUTION: In the plasma type PFC decomposition system where PFC- containing exhaust gas discharged from a plasma device 1 by a first exhaust gas suction device 2 is introduced into a plasma type PFC decomposition device 4 to be decomposed and the decomposed gas is discharged by a second exhaust gas suction device 5, metal impurity removing equipment 3 is installed between the first exhaust gas suction device 2 and the plasma type PFC decomposition device 4. The fixing of the metal impurities to the plasma type PFC decomposition device 4 or piping, the corrosion of the exhaust gas suction devices caused by corrosive gas, and the like, can be inhibited. <P>COPYRIGHT: (C)2004,JPO</p> |
