| 摘要 |
<p>An apparatus for loading a reticle and equipment for processing a semiconductor substrate using the same are provided to load stably the reticle from a reticle cassette to an exposure device by opening correctly the reticle cassette. A reticle cassette(120) is used for receiving a reticle(R). A door(125) is connected with the reticle cassette by using a pivot in order to receive or transmit the reticle. A reticle library(110) is used for receiving the reticle cassette by using a double layer method. An opening unit(130) opens the door by using the pivot. The opening unit has a rectangular contact side which is closely attached to the door. The door opening unit includes a thrust arm(131), a motor for providing rotatory power to the thrust arm, and a bar(135) projected from an end of the thrust arm.</p> |
