| 摘要 |
An electron emission device is provided to absorb effectively internal residual gas and maintain a high degree of vacuum by installing an evaporating getter and a non-evaporating getter. A first and second substrates(2,4) are disposed opposite to each other in order to form a vacuum vessel. An electron emission unit is formed on the first substrate. An emission unit is formed on the second substrate. One or more evaporating getters(32) and one or more non-evaporating getters(34) are installed in the vacuum vessel in order to form a vacuum state of the vacuum vessel. A display region and a non-display region are set on the first and second substrates. The evaporating getters are positioned in the non-display region within the vacuum vessel.
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