| 摘要 |
<p>An alignment method of a photolithography process and an alignment system having a color filter for a photolithography apparatus are provided to identify easily an alignment mark by using the color filter for adjusting a contrast and a color tone. An alignment method of a photolithography process includes a process for identifying an alignment mark(100b) of a wafer(10). The alignment mark is identified by applying a color filter(40) having the same color as a color of the alignment mark to a reticle(20), the alignment mark of the wafer, and an image of a periphery. In addition, the alignment mark is identified by applying the color filter having a color complementary to the color of the image of the periphery to the reticle, the alignment mark of the wafer, and the image of the periphery.</p> |
