发明名称 Method and system for processing semiconductor wafers
摘要 A method for processing semiconductor wafers includes processing a semiconductor wafer in a processing chamber having upper and lower chambers, decoupling the upper chamber from the lower chamber, cleaning the upper chamber, determining, while decoupled, that a leak rate and a particle count for the upper chamber meets predetermined criteria, and coupling the upper chamber to the lower chamber.
申请公布号 US7143660(B2) 申请公布日期 2006.12.05
申请号 US20040804362 申请日期 2004.03.18
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 MAYES STEVEN K.
分类号 G01N19/00;H01J37/32;H01L21/00 主分类号 G01N19/00
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