| 摘要 |
<p>A method for generating an occupancy based pattern for maskless ligthography system is provided to generate a pattern accurately, precisely and rapidly on a substrate, regardless of a shape of light beam, a rotational angle of a micromirror, a moving step of the substrate, and a size, structure and form of pattern. The generation method comprises the steps of: loading CAD data on a memory(101); extracting a pattern boundary and recognizing the pattern from a viewpoint of a substrate establishing a domain-based pattern to generate a pattern(102); defining the pattern domain dependent on a micromirror(103-1), extracting binary-coded pattern data needed for operation of the micromirror on the basis of occupancy(103-2), and recognizing the pattern from a viewpoint of the micromirror establishing the cumulative binary-coded data continuously according to a moving position of the substrate to generate a pattern(103-3); and optionally transmitting the generated cumulative binary-coded pattern data to a micromirror controller(104).</p> |
