SEMICONDUCTOR WAFER AND METHOD OF FABRICATING THE SAME

摘要

A semiconductor wafer and a manufacturing method thereof are provided to improve the performance of NMOS(N channel Metal Oxide Semiconductor) and PMOS(P channel MOS) transistors by using various crystal orientations. A semiconductor wafer includes a base substrate, an insulating layer, and a semiconductor layer. The insulating layer is formed on the base substrate. The semiconductor layer(10b,12b) is formed on the insulating layer. The semiconductor layer has a first surface region and a second surface region. The first surface region(10c) has a first orientation of crystallographic plane. The second surface region(12c) has a second orientation of crystallographic plane.